A Comparison of the Effects of Silicon Oxide and Silicon Nitride Host Matrices on the Photoluminescence from Si Nanocrystals after High Temperature Annealing

dc.contributor.authorRoschuk, T.
dc.contributor.authorZalloum, O. H. Y.
dc.contributor.authorWojcik, J.
dc.contributor.authorZhang, H.
dc.contributor.authorMascher, P.
dc.date.accessioned2022-02-03T11:34:52Z
dc.date.accessioned2022-05-22T08:54:11Z
dc.date.available2022-02-03T11:34:52Z
dc.date.available2022-05-22T08:54:11Z
dc.date.issued2007
dc.description.abstractSi nanoclusters embedded in two different dielectric matrices, silicon oxide and silicon nitride, have been formed through annealing of Si-rich silicon oxide (SRSO) and Si-rich silicon nitride (SRSN) thin films. The light emitting properties of these materials have been analyzed through room temperature UV- excited photoluminescence (PL) experiments. Features of the PL spectra from both types are presented and the nature of light emission from Si-nanoclusters is discussed on the basis of the results from these two different host environments.en_US
dc.identifier.urihttp://localhost:8080/xmlui/handle/123456789/8227
dc.language.isoenen_US
dc.titleA Comparison of the Effects of Silicon Oxide and Silicon Nitride Host Matrices on the Photoluminescence from Si Nanocrystals after High Temperature Annealingen_US
dc.typeArticleen_US

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