dc.contributor.author |
Roschuk, T. |
|
dc.contributor.author |
Wilson, P. R. J. |
|
dc.contributor.author |
Li, J. |
|
dc.contributor.author |
Zalloum, O. H. Y. |
|
dc.contributor.author |
Wojcik, J. |
|
dc.contributor.author |
Mascher, P. |
|
dc.date.accessioned |
2022-01-18T11:52:55Z |
|
dc.date.accessioned |
2022-05-22T08:56:43Z |
|
dc.date.available |
2022-01-18T11:52:55Z |
|
dc.date.available |
2022-05-22T08:56:43Z |
|
dc.date.issued |
2009-12-15 |
|
dc.identifier.uri |
http://localhost:8080/xmlui/handle/123456789/8470 |
|
dc.description.abstract |
The X-ray absorption near edge structure (XANES) and X-ray
excited optical luminescence (XEOL) of a set of photoluminescent rare earth (RE) (Tb, Ce) doped silicon oxide
(SiOx) thin films, having compositions ranging from O-rich
(32% Si) to Si-rich (36% Si), were analyzed at the Si and
O K-edges. The results show that luminescence from these
materials is correlated with the excitation of O-related energy
states, and demonstrate that the composition and bonding
structure of the silicon oxide host matrix play an active role in
determining the luminescent properties of these materials,
although the microstructure of the films may vary from film
to film |
en_US |
dc.language.iso |
en |
en_US |
dc.publisher |
Wiley-VCH |
en_US |
dc.relation.ispartofseries |
DOI;10.1002/pssb.200945531 |
|
dc.title |
Structure and luminescence of rare earth-doped silicon oxides studied through their X-ray absorption near edge structure and X-ray excited optical luminescence |
en_US |
dc.type |
Article |
en_US |